Fabrication of ZnS thin film using water bath method

Yuhang Zhao; Xiaobo Zhu; Wenhua Gu

doi:10.1117/12.2534739

6 December 2019 Fabrication of ZnS thin film using water bath method

Yuhang Zhao, Xiaobo Zhu, Wenhua Gu

Proceedings Volume 11371, International Workshop on Thin Films for Electronics, Electro-Optics, Energy, and Sensors 2019; 113710B (2019) https://doi.org/10.1117/12.2534739
Event: International Workshop on Thin Films for Electronics, Electro-Optics, Energy and Sensors, 2019, Reykjavik, Iceland

Abstract

ZnS thin film has wide applications in optoelectronics area, including photocatalysis and solar cells. The water bath is a popular ZnS thin film fabrication method, with merits of high efficiency, easy-operation, low cost, and uniform deposition. In this report, ZnSO₄7H₂O and thiourea were mixed in the water bath for reaction at a constant temperature with mechanical stirring. Thus-deposited ZnS thin film was then annealed in Ar. The impacts of different pH, different concentration, different water bath temperature, and different annealing temperature and time were studied to find the optimal condition. The optimal results were as follows: the mixture of 0.056mol/L thiourea and 0.0532mol/L ZnSO₄7H₂O in water was titrated to pH=10.7 by ammonia, followed by water bath reaction at 85°C, then annealed in Ar at 300°C for 1.5h. Thus fabricated ZnS thin film has the best surface flatness and film uniformity, with high optical transmittance.

Citation Download Citation

Yuhang Zhao, Xiaobo Zhu, and Wenhua Gu "Fabrication of ZnS thin film using water bath method", Proc. SPIE 11371, International Workshop on Thin Films for Electronics, Electro-Optics, Energy, and Sensors 2019, 113710B (6 December 2019); https://doi.org/10.1117/12.2534739

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