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At short wavelengths (λ - 5nm) a highly reflecting multilayer must consist of a large number of layers, in which the layer interfaces are sharply defined and the strongly absorbing (metal) component layers are as thin as possible. The mininum thickness of a microcrystalline metal layer is apparently set by the unit cell dimensions, the lateral dimensions of each microcrystallite, by the deposition conditions and nature of the metal. The influence of these parameters is described and related to the fabrication of short wavelength reflecting mirrors.
Brian L. Evans,Ali M. H. Al Arab, andShi Xu
"Short Wavelength Imaging Characteristics Of Figured Multilayer Mirrors", Proc. SPIE 1140, X-Ray Instrumentation in Medicine and Biology, Plasma Physics, Astrophysics, and Synchrotron Radiation, (27 November 1989); https://doi.org/10.1117/12.961855
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Brian L. Evans, Ali M. H. Al Arab, Shi Xu, "Short Wavelength Imaging Characteristics Of Figured Multilayer Mirrors," Proc. SPIE 1140, X-Ray Instrumentation in Medicine and Biology, Plasma Physics, Astrophysics, and Synchrotron Radiation, (27 November 1989); https://doi.org/10.1117/12.961855