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Ultraviolet spectroscopy for astrophysics allows us to address key scientific goals ranging from exoplanets and their environments to stars of all types and ages to galaxies and their evolution. In order to achieve these goals, spectrographs must realize improvements in sensitivity and resolving power. Recent advancements in reflection gratings for X-ray astronomy have enabled concurrent increases in these performance requirements. The nanofabrication-based techniques are now being applied to UV gratings with electron beam lithography (EBL) lying at the heart of the processing steps. EBL allows for custom groove distributions on flat and curved substrates thus opening new parameter space for spectrograph optimization. Blazed profiles are also realizable using EBL itself or subsequent processing steps. We report here the early results of fabrication work and performance testing on UV gratings intended for use on a variety of platforms from upcoming suborbital rockets, to Explorer and Flagship concept missions.
Randall L. McEntaffer
"Toward high-performance UV spectroscopy in astrophysics: EBL-enabled diffraction gratings", Proc. SPIE 11755, Sensors and Systems for Space Applications XIV, 1175504 (12 April 2021); https://doi.org/10.1117/12.2582218
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Randall L. McEntaffer, "Toward high-performance UV spectroscopy in astrophysics: EBL-enabled diffraction gratings," Proc. SPIE 11755, Sensors and Systems for Space Applications XIV, 1175504 (12 April 2021); https://doi.org/10.1117/12.2582218