Spatial atomic layer deposition: a new revolution in high-volume manufacturing of plasma-enhanced thin films

John-Olof Rönn; Sauli Virtanen; Paula Päivike; Mikko Konttinen; Kalle Niiranen; Mikael Saarniheimo; Sami Sneck

doi:10.1117/12.2602662

28 October 2021 Spatial atomic layer deposition: a new revolution in high-volume manufacturing of plasma-enhanced thin films

John-Olof Rönn, Sauli Virtanen, Paula Päivike, Mikko Konttinen, Kalle Niiranen, Mikael Saarniheimo, Sami Sneck

Author Affiliations +

Proceedings Volume 11889, Optifab 2021; 118890J (2021) https://doi.org/10.1117/12.2602662
Event: SPIE Optifab, 2021, Rochester, New York, United States

Abstract

With more than 40 years of experience in ALD and thin film deposition technology, Beneq has developed a new-generation ALD technology that revolutionizes high volume manufacturing of plasma-enhanced thin films: the spatial ALD. In spatial ALD, the substrate is rotated across successive process zones to achieve ultra-fast and high-precision thin film deposition. In this work, we present the latest results obtained with the novel Beneq C2R spatial ALD system, including the fabrication of SiO2, Ta2O5 and Al2O3 with deposition rates reaching > 1 µm/h on 200 mm wafers. Ultimately, our technology overcomes the challenges of traditional ALD and paves the way for the large volume production of optical components on the most challenging surfaces found in the industry.

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John-Olof Rönn, Sauli Virtanen, Paula Päivike, Mikko Konttinen, Kalle Niiranen, Mikael Saarniheimo, and Sami Sneck "Spatial atomic layer deposition: a new revolution in high-volume manufacturing of plasma-enhanced thin films", Proc. SPIE 11889, Optifab 2021, 118890J (28 October 2021); https://doi.org/10.1117/12.2602662

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