Examining strategies to control gel-like defects in EUV patterning materials

Shunji Kawato; Kozue Miura; Jinhwan Ahn; JongHoon Kim

doi:10.1117/12.2614019

25 May 2022 Examining strategies to control gel-like defects in EUV patterning materials

Shunji Kawato, Kozue Miura, Jinhwan Ahn, JongHoon Kim

Proceedings Volume 12055, Advances in Patterning Materials and Processes XXXIX; 120550S (2022) https://doi.org/10.1117/12.2614019
Event: SPIE Advanced Lithography + Patterning, 2022, San Jose, California, United States

Conference Poster

Abstract

EUV chemically amplified resists (CAR) use a copolymer containing highly-polar poly hydroxy styrene (PHS), which is believed to easily aggregate and form gel-like polymers. These aggregates likely generate microbridge defects, an important yield detractor in leading-edge semiconductor manufacturing. Improvements in EUV photoresist quality and a reduction in on wafer defectivity require more selective removal for this specific contamination source. Earlier presentations have demonstrated the benefit of effective removal of gel-like polymers in ArF immersion photoresists using photochemical filters with functionalized membrane technology [1]. In this paper we introduce a new filter technology for gel-like polymer removal in EUV photoresists. This contamination control technology demonstrates improved efficiency for removing partial, highly polar chemicals and fine particles that cause gel-like polymers over previous filter generations. The filter also improves on wafer defect counts.

Citation Download Citation

Shunji Kawato, Kozue Miura, Jinhwan Ahn, and JongHoon Kim "Examining strategies to control gel-like defects in EUV patterning materials", Proc. SPIE 12055, Advances in Patterning Materials and Processes XXXIX, 120550S (25 May 2022); https://doi.org/10.1117/12.2614019

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