Modeling of ferrite thin-film structure using FDTD method in optoelectronic devices

Yue Wu; Hongxing Zheng

doi:10.1117/12.2604721

13 December 2021 Modeling of ferrite thin-film structure using FDTD method in optoelectronic devices

Yue Wu, Hongxing Zheng

Proceedings Volume 12074, 10th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Novel Optoelectronic Functional Materials and Devices; 1207402 (2021) https://doi.org/10.1117/12.2604721
Event: Tenth International Symposium on Advanced Optical Manufacturing and Testing Technologies (AOMATT 2021), 2021, Chengdu, China

Abstract

In this paper, we have studied a new film structure to improve the characteristics of optical filtering. We have changed the thickness and material of the metal oxide and ferrite material. And the structure of the film shows different absorbing properties, which can be utilized in different scenarios as we need. We chose this kind of thin film structure for simulation modeling with the finite-difference time-domain (FDTD) method, and analyzed of this nanostructure under three-dimensional conditions. The results demonstrate that in the three-dimensional structure, not only the material properties, but also the thickness. which will have a far-reaching influence on the absorption characteristics. Besides, Surface ion effect can affect the performance of the film. Therefore, this structure in the field of nanostructures has broad application prospects, such as microwave devices multichannel communication and so on.

Citation Download Citation

Yue Wu and Hongxing Zheng "Modeling of ferrite thin-film structure using FDTD method in optoelectronic devices", Proc. SPIE 12074, 10th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Novel Optoelectronic Functional Materials and Devices, 1207402 (13 December 2021); https://doi.org/10.1117/12.2604721

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