Poster + Presentation + Paper
25 May 2022 Amorphous WO3 as transparent conductive oxide in the near-IR
Author Affiliations +
Conference Poster
Abstract
The demand for transparent conductive films (TCFs) is dramatically increasing. In this work tungsten oxide (WO3-x) is studied as a possible option additional to the existed TCFs. We introduce WO3-x thin films fabricated by a non-reactive magnetron RF-sputtering process at room temperature, followed by thermal annealing in dry air. Films are characterized morphologically, structurally, electrically, optically, and dielectrically. Amorphous WO3-x thin films are shown to be n-type conductive while the transparency extends to the near-IR. By evaluating a figure of merit for transparent-conductive performance and comparing to some most-widely used TCFs, WO3-x turns out to outperform in the near-IR optical range
Conference Presentation
© (2022) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Hao Chen, Alice Carlotto, Cristina Armellini, Marco Cassinelli, Mario Caironi, Mohamed Zaghloul, Alberto Tagliaferri, Alessandro Chiasera, and Silvia M. Pietralunga "Amorphous WO3 as transparent conductive oxide in the near-IR", Proc. SPIE 12142, Fiber Lasers and Glass Photonics: Materials through Applications III, 121421J (25 May 2022); https://doi.org/10.1117/12.2626565
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KEYWORDS
Thin films

Annealing

Oxides

Transmittance

Near infrared

Transparent conductors

Dielectrics

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