Presentation + Paper
16 March 2023 Scanning overlapped phase interference lithography system for manufacturing optical waveguide combiner
Yohei Nawaki, Kentaro Nomoto, Shunta Sugisaki, Shinji Orihara, Kazuyuki Tsuruoka
Author Affiliations +
Abstract
We have been developing Scanning Overlapped Phase Interference Lithography (SOPHIL) system which can provide an excellent grid pitch uniformity, 380 nm+-0.005 nm over the entire 200 mm diameter substrate. The SOPHIL method consists of two steps. As the first step, a spot fringe pattern generated by two-beam interference is scanned direction along the grid on the wafer. As the second step, the spot is moved just the integer multiple length of its fringe period, then the spot is exposed again over the 1st fringe pattern. We achieved the pitch uniformity of +-0.002%, and also 180 nm pitch pattern was confirmed.
Conference Presentation
© (2023) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Yohei Nawaki, Kentaro Nomoto, Shunta Sugisaki, Shinji Orihara, and Kazuyuki Tsuruoka "Scanning overlapped phase interference lithography system for manufacturing optical waveguide combiner", Proc. SPIE 12449, Optical Architectures for Displays and Sensing in Augmented, Virtual, and Mixed Reality (AR, VR, MR) IV, 1244907 (16 March 2023); https://doi.org/10.1117/12.2667155
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KEYWORDS
Lithography

Waveguides

Semiconducting wafers

Fringe analysis

Diffraction gratings

Optical scanning systems

Manufacturing

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