Atomic force microscopy electrostatic nanolithography (AFMEN): a versatile tool for nano-patterning in thin films and beyond

Sergei F. Lyuksyutov

doi:10.1117/12.2646087

31 January 2023 Atomic force microscopy electrostatic nanolithography (AFMEN): a versatile tool for nano-patterning in thin films and beyond

Sergei F. Lyuksyutov

Author Affiliations +

Proceedings Volume 12477, International Workshop on Thin Films for Electronics, Electro-Optics, Energy and Sensors 2022; 124770K (2023) https://doi.org/10.1117/12.2646087
Event: International Workshop on Thin Films for Electronics, Electro-Optics, Energy and Sensors, 2022, Boston, Massachusetts, United States

Abstract

A variety of materials can be used for the AFMEN including exfoliated graphene, Si (100) treated with solvents, polymer films, and styrene butadiene rubber. This simple one-two stage approach is a tool to pattern almost any semiconductor or dielectric surface at the nanoscale.

Citation Download Citation

Sergei F. Lyuksyutov "Atomic force microscopy electrostatic nanolithography (AFMEN): a versatile tool for nano-patterning in thin films and beyond", Proc. SPIE 12477, International Workshop on Thin Films for Electronics, Electro-Optics, Energy and Sensors 2022, 124770K (31 January 2023); https://doi.org/10.1117/12.2646087

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