Understanding polymer distribution in the photoresist materials using liquid chromatography

Kyuhyun Im; Younhyun Kwak; Minsang Kim; Changheon Lee

doi:10.1117/12.2657610

30 April 2023 Understanding polymer distribution in the photoresist materials using liquid chromatography

Kyuhyun Im, Younhyun Kwak, Minsang Kim, Changheon Lee

Proceedings Volume 12498, Advances in Patterning Materials and Processes XL; 124980L (2023) https://doi.org/10.1117/12.2657610
Event: SPIE Advanced Lithography + Patterning, 2023, San Jose, California, United States

Abstract

The emergence of extreme ultraviolet (EUV) sources utilizing 13.5 nm for high volume manufacturing played a role in upgrading semiconductor technology once again. The demand for photoresists to satisfy smaller and more advanced nodes is becoming increasingly important and challenging. The aim of this work is to investigate the chromatographic techniques to separate random copolymer for photoresist materials according to chemical composition. A systematic study is reported for a fundamental understanding of how the molecular weight distribution and chemical composition of polymers included in photoresist affect lithography performance. Compared to other conventional methods such as GPC, the new approach in this study is accurate and high resolution, and can be utilized to identify and quantify the organic polymer in photoresist

Conference Presentation

Citation Download Citation

Kyuhyun Im, Younhyun Kwak, Minsang Kim, and Changheon Lee "Understanding polymer distribution in the photoresist materials using liquid chromatography", Proc. SPIE 12498, Advances in Patterning Materials and Processes XL, 124980L (30 April 2023); https://doi.org/10.1117/12.2657610

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KEYWORDS

Photoresist materials

Polymers

Chromatography

Liquids

Extreme ultraviolet

High volume manufacturing

Lithography

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