Electron beam and optical patterning of polymerizable ionic liquid-based resists

Natalia Turek; Andrea Szpecht; Aleksandra Szymańska; Tomasz Stefaniuk; Katarzyna Komorowska

doi:10.1117/12.2658445

30 April 2023 Electron beam and optical patterning of polymerizable ionic liquid-based resists

Natalia Turek, Andrea Szpecht, Aleksandra Szymańska, Tomasz Stefaniuk, Katarzyna Komorowska

Proceedings Volume 12498, Advances in Patterning Materials and Processes XL; 124981S (2023) https://doi.org/10.1117/12.2658445
Event: SPIE Advanced Lithography + Patterning, 2023, San Jose, California, United States

Conference Poster

Abstract

For many years ionic liquids (ILs) have attracted the interest of the scientific community, finding new applications in green chemistry, chemical engineering, environmental science, and others. All applications have emerged due to ILs unique physiochemical properties like negligible volatility, high thermal stability, low toxicity, and very wide range of structural diversity. In our research we develop and exploit all of the advantages associated with the ILs molecules for lithographic patterning, expanding their applications to lithography resists. In this work we present the results of patterning achieved for different types of ionic liquids with vinylbenzyl and trimethoxysilyl groups.

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Natalia Turek, Andrea Szpecht, Aleksandra Szymańska, Tomasz Stefaniuk, and Katarzyna Komorowska "Electron beam and optical patterning of polymerizable ionic liquid-based resists", Proc. SPIE 12498, Advances in Patterning Materials and Processes XL, 124981S (30 April 2023); https://doi.org/10.1117/12.2658445

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