Presentation + Paper
15 August 2023 Double-pass modulated differential confocal microscopy for closed-loop axial control of direct laser writing
Johannes Belkner, Jaqueline Stauffenberg, Christian Görner Tenorio, Ingo Ortlepp, Eberhard Manske
Author Affiliations +
Abstract
Direct laser writing is a popular method for mask-less lithography that already achieved commercial grade. However, it is still challenging to realize homogeneously exposed structures on 3D-shaped substrates. A common source of the variation in exposure is a changing distance of the substrate surface with the photoresist towards the plane of the narrowest waist of the exposure beam. To tackle this issue, we propose a differential confocal probe that employs a spatially modulated pinhole. This phase-modulated lock-in principle enables highly resolved depth sensing without ambiguity about the direction of the deviation from the focal plane. However, the modulation contrast must be high enough to achieve this, which is why the measuring beam passes the pinhole twice. This probe is integrated into the nanopositioning and nanomeasuring machine via a position-based controller. We demonstrate the capability to follow 10◦ inclined substrates.
Conference Presentation
© (2023) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Johannes Belkner, Jaqueline Stauffenberg, Christian Görner Tenorio, Ingo Ortlepp, and Eberhard Manske "Double-pass modulated differential confocal microscopy for closed-loop axial control of direct laser writing", Proc. SPIE 12618, Optical Measurement Systems for Industrial Inspection XIII, 126180R (15 August 2023); https://doi.org/10.1117/12.2673874
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KEYWORDS
Confocal microscopy

Modulation

Microscopes

Interferometers

Aspheric lenses

Lithography

Manufacturing

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