Application of the in-situ dyeing effect for an image reversal resist

Dan V. Nicolau; Mircea V. Dusa

doi:10.1117/12.20110

1 June 1990 Application of the in-situ dyeing effect for an image reversal resist

Dan V. Nicolau, Mircea V. Dusa

Proceedings Volume 1262, Advances in Resist Technology and Processing VII; (1990) https://doi.org/10.1117/12.20110
Event: Microlithography '90, 1990, San Jose, CA, United States

Abstract

The dyeing effect observed at an image reversal resist, are explained using tTh-Vis spectropbotanetry , and on that basis, the canputations of A , B, C and y values used in SAMPLE simulations prove the lithographic properties of this technique.

Citation Download Citation

Dan V. Nicolau and Mircea V. Dusa "Application of the in-situ dyeing effect for an image reversal resist", Proc. SPIE 1262, Advances in Resist Technology and Processing VII, (1 June 1990); https://doi.org/10.1117/12.20110

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