Programmable photomask for photolithography systems

Richard Beaudry; Md. Iftekharul Islam; Amrid Amnache; Maurice Delafosse; Luc Fréchette

doi:10.1117/12.2685213

21 November 2023 Programmable photomask for photolithography systems

Richard Beaudry, Md. Iftekharul Islam, Amrid Amnache, Maurice Delafosse, Luc Fréchette

Proceedings Volume 12751, Photomask Technology 2023; 1275111 (2023) https://doi.org/10.1117/12.2685213
Event: SPIE Photomask Technology + EUV Lithography, 2023, Monterey, California, United States

Conference Poster

Abstract

Digital lithography shortens development cycle time. Laser-based lithography is slow and lacks in overlay precision. The DIGITHO programmable photomask fits into standard photolithography steppers without system modifications. It can generate a different mask for each exposure. DIGITHO offers the most cost-effective solution for die-level serialization and fast prototyping to high throughput manufacturing.

Citation Download Citation

Richard Beaudry, Md. Iftekharul Islam, Amrid Amnache, Maurice Delafosse, and Luc Fréchette "Programmable photomask for photolithography systems", Proc. SPIE 12751, Photomask Technology 2023, 1275111 (21 November 2023); https://doi.org/10.1117/12.2685213

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