Design of filament-type auxiliary ion source and study on its improvement of thin film parameters

Yi Ren; Yin Zhang; Yadong Zhou; Shangzhong Jin

doi:10.1117/12.3025158

8 February 2024 Design of filament-type auxiliary ion source and study on its improvement of thin film parameters

Yi Ren, Yin Zhang, Yadong Zhou, Shangzhong Jin

Proceedings Volume 13066, International Conference on Optoelectronic Materials and Devices (ICOMD 2023); 130660J (2024) https://doi.org/10.1117/12.3025158
Event: 2023 International Conference on Optoelectronic Materials and Devices (COMD 2023), 2023, Chongqing, China

Abstract

In order to improve the purity, compactness and uniformity of magnetron sputtering deposited films at a lower cost, a dual-chamber DC heating filament auxiliary ion source was designed which can activate oxygen. The working parameters of the auxiliary ion source were changed in the experiment to explore their influence on the optical parameters of the films deposited by magnetron sputtering coater. By comparing the transmittance, refractive index and relative thickness of the films which was deposited under different processing conditions, it is finally proved that the auxiliary ion source designed in this work can improve the transmittance, compactness and uniformity of the single-layer films of Ta₂0₅ and SiO₂ which was coated in this experiment. Thus, the coating quality and effective coating area of the original magnetron sputtering coating machine are improved, and it does have certain practical significance for improving the efficiency of the coating.

(2024) Published by SPIE. Downloading of the abstract is permitted for personal use only.

Citation Download Citation

Yi Ren, Yin Zhang, Yadong Zhou, and Shangzhong Jin "Design of filament-type auxiliary ion source and study on its improvement of thin film parameters", Proc. SPIE 13066, International Conference on Optoelectronic Materials and Devices (ICOMD 2023), 130660J (8 February 2024); https://doi.org/10.1117/12.3025158

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KEYWORDS

Ions

Anodes

Magnetism

Ion beams

Coating

Sputter deposition

Electrons

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