Spatial separation of EUV emission and energetic ions by use of double-laser-pulse irradiation

Tsukasa Sugiura; Hayato Yazawa; Takeru Niinuma; Masaki Kume; Hiroki Morita; Takeshi Higashiguchi

doi:10.1117/12.3032289

26 August 2024 Spatial separation of EUV emission and energetic ions by use of double-laser-pulse irradiation

Tsukasa Sugiura, Hayato Yazawa, Takeru Niinuma, Masaki Kume, Hiroki Morita, Takeshi Higashiguchi

Proceedings Volume 13177, Photomask Japan 2024: XXX Symposium on Photomask and Next-Generation Lithography Mask Technology; 1317715 (2024) https://doi.org/10.1117/12.3032289
Event: Photomask Japan 2024, 2024, Yokohama, Japan

Abstract

We have demonstrated the spatial separation of extreme ultraviolet (EUV) emission and energetic tin (Sn) ions as debris from a laser-produced plasma (LPP) with a double-laser-pulse irradiation scheme based on a plasma X-ray laser configuration. We used two Nd:YAG lasers operating at a wavelength of 1064 nm for pre- and main pulses. The pre-pulse at a laser intensity of 2×10⁸ W/cm² was irradiated to the Sn solid planar target to produce a pre-plasma. After 20 ns from pre-pulse irradiation, the main pulse at a laser intensity of 2×10¹¹ W/cm² was irradiated in a tangential direction to the pre-plasma. We observed the angular distributions of EUV emission and energetic ions using an X-ray diode and a Faraday cup. The EUV was slightly emitted toward the main pulse. On the other hand, energetic ions were emitted toward the prepulse side. Under similar conditions, charge-separated energetic Sn ions were measured using an electrostatic energy analyzer (ESA), and the maximum kinetic energy and maximum valence were reduced.

(2024) Published by SPIE. Downloading of the abstract is permitted for personal use only.

Citation Download Citation

Tsukasa Sugiura, Hayato Yazawa, Takeru Niinuma, Masaki Kume, Hiroki Morita, and Takeshi Higashiguchi "Spatial separation of EUV emission and energetic ions by use of double-laser-pulse irradiation", Proc. SPIE 13177, Photomask Japan 2024: XXX Symposium on Photomask and Next-Generation Lithography Mask Technology, 1317715 (26 August 2024); https://doi.org/10.1117/12.3032289

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