Method of monitoring nonquarter-wavelength film thickness by turning point

Anmin Zheng; Yixun Yan; Fengshan Zhang

doi:10.1117/12.22406

1 December 1990 Method of monitoring nonquarter-wavelength film thickness by turning point

Anmin Zheng, Yixun Yan, Fengshan Zhang

Proceedings Volume 1323, Optical Thin Films III: New Developments; (1990) https://doi.org/10.1117/12.22406
Event: 34th Annual International Technical Symposium on Optical and Optoelectronic Applied Science and Engineering, 1990, San Diego, CA, United States

Abstract

A method is presented for nionitoring Taultilayer structures with nonquarter wavelength thickness. This method is similar to the conventional turning point method, except that the irronitoring wavelength selected by adniittance diagram will be changed with layers. Results are given for the use of this method in depositing Antireflectance coatings (ARC.)

Citation Download Citation

Anmin Zheng, Yixun Yan, and Fengshan Zhang "Method of monitoring nonquarter-wavelength film thickness by turning point", Proc. SPIE 1323, Optical Thin Films III: New Developments, (1 December 1990); https://doi.org/10.1117/12.22406

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