Plasma-enhanced CVD hard coatings for opthalmic optics

Werner Klug; Roland Schneider; Alfons Zoeller

doi:10.1117/12.22376

1 December 1990 Plasma-enhanced CVD hard coatings for opthalmic optics

Werner Klug, Roland Schneider, Alfons Zoeller

Proceedings Volume 1323, Optical Thin Films III: New Developments; (1990) https://doi.org/10.1117/12.22376
Event: 34th Annual International Technical Symposium on Optical and Optoelectronic Applied Science and Engineering, 1990, San Diego, CA, United States

Abstract

To protect the soft surface of organic CR 39 ophthalmic lenses we built up a parallel plate reactor and developed a Plasma Enhanced Chemical Vapor Deposition (PECVD) process for Si02 protection films. Beside high transmission in the VIS-range we obtained refractive indices between n=1.46 and n=l.49 depending on the process parameters at layer- thicknesses of 2,5 jnn to 5 jmt. Deposition rates up to 30 A/s and thickness uniformities of 10 % were achieved. The mechanical properties of these layers were tested with different methodes and gave better results compared with other technologies like ion-assisted deposition or lacquering.

Citation Download Citation

Werner Klug, Roland Schneider, and Alfons Zoeller "Plasma-enhanced CVD hard coatings for opthalmic optics", Proc. SPIE 1323, Optical Thin Films III: New Developments, (1 December 1990); https://doi.org/10.1117/12.22376

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