Mask management in optimized photolithography scheduling of a high-mix semiconductor manufacturing facility

Renaud Roussel; Camille Babin; Abdel Bitar; Sebastian Knopp; Stéphane Dauzère-Pérès; Karim Tamssaouet

doi:10.1117/12.3029925

18 September 2024 Mask management in optimized photolithography scheduling of a high-mix semiconductor manufacturing facility

Renaud Roussel, Camille Babin, Abdel Bitar, Sebastian Knopp, Stéphane Dauzère-Pérès, Karim Tamssaouet

Author Affiliations +

Proceedings Volume 13273, 39th European Mask and Lithography Conference (EMLC 2024); 132730D (2024) https://doi.org/10.1117/12.3029925
Event: 39th European Mask and Lithography Conference (EMLC 2024), 2024, Grenoble, France

Abstract

This paper presents the challenges and results of implementing an optimization-based scheduling engine in a high-mix 300mm fully automated semiconductor manufacturing facility. Efficient scheduling of lots on photolithography machines is crucial due to their high cost and critical role in production. Optimally managing the transportation, storage and inspection of a large number of masks is essential to ensure this efficiency. Initially deployed in the cleaning and diffusion work center, the optimization engine was adapted for photolithography and is operational since May 2024. This generic engine solves large multi-objective scheduling problems in minutes, considering diverse constraints related to processing and transportation resources, product quality, and global production targets. The successful deployment demonstrates the engine’s potential for full factory scheduling, with ongoing efforts to enhance its genericity, efficiency, and effectiveness.

(2024) Published by SPIE. Downloading of the abstract is permitted for personal use only.

Citation Download Citation

Renaud Roussel, Camille Babin, Abdel Bitar, Sebastian Knopp, Stéphane Dauzère-Pérès, and Karim Tamssaouet "Mask management in optimized photolithography scheduling of a high-mix semiconductor manufacturing facility", Proc. SPIE 13273, 39th European Mask and Lithography Conference (EMLC 2024), 132730D (18 September 2024); https://doi.org/10.1117/12.3029925

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available