Paper
12 December 2024 Research on nanoscale grid pitch characterization method based on metrological atomic force microscopy
Chong Yue, Yueqing Ding, Zhen Wu, Lei Tao, Yingqian Ni, Kun Jiang
Author Affiliations +
Proceedings Volume 13446, Sixth International Conference on Optoelectronic Science and Materials (ICOSM 2024); 134461D (2024) https://doi.org/10.1117/12.3054245
Event: 6th International Conference on Optoelectronic Science and Materials (ICOSM 2024), 2024, Hefei, China
Abstract
This paper develops a metrological atomic force microscopy system for nanoscale grid pitch characterization. Firstly, the principle of metrological atomic force microscopy and the roughness measurement method are introduced. Second, analyzed the evaluation principle of micro nano feature structures, mainly analyzed the evaluation algorithm of grid pitch, and developed an evaluation program using MATLAB. Then multiple methods are applied to measure grid pitch, and an evaluation program was developed using MATLAB to evaluate and calculate the measurement data, verifying the feasibility and reliability of each evaluation algorithm. Finally, the same grid pitch is compared and measured using metrological AFM and white light interferometer. The results show that the average measurement value is 200.14 nm, the standard deviation is 0.20 nm, and the difference is within the allowable error range. In addition, the metrological atomic force microscopy measurement method has the characteristics of high measurement accuracy, small measurement range, slow speed and no requirement for material, which provides technical support for process personnel how to choose the measurement scheme.
(2024) Published by SPIE. Downloading of the abstract is permitted for personal use only.
Chong Yue, Yueqing Ding, Zhen Wu, Lei Tao, Yingqian Ni, and Kun Jiang "Research on nanoscale grid pitch characterization method based on metrological atomic force microscopy", Proc. SPIE 13446, Sixth International Conference on Optoelectronic Science and Materials (ICOSM 2024), 134461D (12 December 2024); https://doi.org/10.1117/12.3054245
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KEYWORDS
Atomic force microscopy

Metrology

Atomic force microscope

Interferometers

Algorithm development

Raster graphics

Reliability

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