Lens for microlithography

Hung-yu Hsieh; Jerome F. Wagner

doi:10.1117/12.25845

1 March 1991 Lens for microlithography

Hung-yu Hsieh, Jerome F. Wagner

Proceedings Volume 1396, Applications of Optical Engineering: Proceedings of OE/Midwest '90; (1991) https://doi.org/10.1117/12.25845
Event: Applications of Optical Engineering: Proceedings of OE/Midwest '90, 1990, Rosemont, IL, United States

Abstract

With the help of CODE V (a powerful tool for lens design) a fourteen element and two cemented doublet lens system with 0. 2 Reduction rate (Red) 10 cm field diameter 0. 32 numerical aperwre (NA) was obtained. The criteria for a microlithographic lens system applied to the lens will be discussed. 1.

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Hung-yu Hsieh and Jerome F. Wagner "Lens for microlithography", Proc. SPIE 1396, Applications of Optical Engineering: Proceedings of OE/Midwest '90, (1 March 1991); https://doi.org/10.1117/12.25845

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KEYWORDS

Lens design

Distortion

Optical lithography

Optical components

Semiconducting wafers

Code v

Glasses

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