Soft x-ray projection lithography system design and cost analysis

Natale M. Ceglio; Andrew M. Hawryluk

doi:10.1117/12.51272

1 January 1992 Soft x-ray projection lithography system design and cost analysis

Natale M. Ceglio, Andrew M. Hawryluk

Proceedings Volume 1547, Multilayer Optics for Advanced X-Ray Applications; (1992) https://doi.org/10.1117/12.51272
Event: San Diego, '91, 1991, San Diego, CA, United States

Abstract

A baseline design and wafer cost analysis for a soft x-ray projection lithography (SXPL) system are presented. The design study provides an overview of the likely form and structure of a SXPL prototype. The wafer cost analysis provides an assessment of the relative importance of different cost factors in the SXPL system.

Citation Download Citation

Natale M. Ceglio and Andrew M. Hawryluk "Soft x-ray projection lithography system design and cost analysis", Proc. SPIE 1547, Multilayer Optics for Advanced X-Ray Applications, (1 January 1992); https://doi.org/10.1117/12.51272

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available