Laterally-injected high-performance lasers by impurity-induced disordering

Wei-Xiong Zou; K. K. Law; Liangchen Wang; D. Bruce Young; James L. Merz; Richard J. Fu; Chi-Shain Hong

doi:10.1117/12.59174

26 June 1992 Laterally-injected high-performance lasers by impurity-induced disordering

Wei-Xiong Zou, K. K. Law, Liangchen Wang, D. Bruce Young, James L. Merz, Richard J. Fu, Chi-Shain Hong

Proceedings Volume 1634, Laser Diode Technology and Applications IV; (1992) https://doi.org/10.1117/12.59174
Event: OE/LASE '92, 1992, Los Angeles, CA, United States

Abstract

We report on novel laterally-injected lasers by impurity-induced disordering (lID) having a self-aligned structure and planar configuration. The laterally-injected lID (LID) lasers have minimum threshold current I=2.6 mA, maximum light output 12 mW with differential quantum efficiency 1d3697' per facet at RT CW operation. The LID laser can also be injected vertically by using an ndoped (instead of semi-insulating) GaAs substrate and making additional ohmic contact on the bottom surface of the wafer. The problem of having much higher series resistance when the laser was in the lateral injection mode than in the vertical injection mode was investigated by studying the I-V characteristics of different combinations of the top and bottom ohmic contacts, and was solved by revising the material design and the device processing procedures.

Citation Download Citation

Wei-Xiong Zou, K. K. Law, Liangchen Wang, D. Bruce Young, James L. Merz, Richard J. Fu, and Chi-Shain Hong "Laterally-injected high-performance lasers by impurity-induced disordering", Proc. SPIE 1634, Laser Diode Technology and Applications IV, (26 June 1992); https://doi.org/10.1117/12.59174

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