Optimization of partially coherent illumination in x-ray lithography (Poster Paper)

Franco Cerrina; Jerry Z.Y. Guo

doi:10.1117/12.136046

9 July 1992 Optimization of partially coherent illumination in x-ray lithography (Poster Paper)

Franco Cerrina, Jerry Z.Y. Guo

Proceedings Volume 1671, Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing II; (1992) https://doi.org/10.1117/12.136046
Event: Microlithography '92, 1992, San Jose, CA, United States

Abstract

Based on the simplified yet accurate model we developed, a route to an optimized x-ray lithography system is defined. It predicts a large exposure window with a less coherent illumination than those currently used in most synchrotron radiation based exposure systems. Two different schemes of coherence reduction are proposed and their effects are simulated.

Citation Download Citation

Franco Cerrina and Jerry Z.Y. Guo "Optimization of partially coherent illumination in x-ray lithography (Poster Paper)", Proc. SPIE 1671, Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing II, (9 July 1992); https://doi.org/10.1117/12.136046

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