Paper
1 June 1992 Shape effects of edge-line phase shifter on light intensity contrast
Mitsunori Nakatani, Hirofumi Nakano, Haruhiko Kusunose, Kazuya Kamon, Shuichi Matsuda, Yaichiro Watakabe, Hirozo Takano, Mutuyuki Otsubo
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Abstract
By using two-dimensional simulation, dependence of light intensity contrast on numerical aperture (NA), coherence factor (a) of i-line stepper, shifter-width, phase error and slope angle of phase shifter edges have been investigated. For the slope angle of 90° and the shifter phase of 180°, the highest contrast is obtained for NA=0.65 and a=0.3. As the slope angle becomes to be small, contrast degrades remarkably for high NA(=0.65). On these simulation, 0.18pm resolution limit of isolated space pattern is successfully realized using an image reversal resist process.
© (1992) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Mitsunori Nakatani, Hirofumi Nakano, Haruhiko Kusunose, Kazuya Kamon, Shuichi Matsuda, Yaichiro Watakabe, Hirozo Takano, and Mutuyuki Otsubo "Shape effects of edge-line phase shifter on light intensity contrast", Proc. SPIE 1674, Optical/Laser Microlithography V, (1 June 1992); https://doi.org/10.1117/12.130350
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Cited by 3 scholarly publications.
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KEYWORDS
Phase shifts

Image processing

Photoresist processing

Optical lithography

Field effect transistors

Gallium arsenide

Image resolution

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