Paper
2 December 1992 Design and fabrication of InGaAsP/InP waveguide modulators for microwave applications
Paul K. L. Yu, Yet Zen Liu, Albert L. Kellner, Andrew R. Williams, Benson C. Lam, X. S. Jiang
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Abstract
InGaAs/InP multiple quantum well electroabsorption modulators grown by MOCVD are designed and fabricated for 1.5 micrometers wavelength operation. For rib loaded waveguide modulators fabricated on n-InP substrate with a 3 micrometers rib width and a 2 micrometers intrinsic waveguide layer, a capacitance of 0.2 to 0.3 pF and a reverse breakdown voltage > 20 V are obtained. The extinction ratio of the modulators is more than 14 dB and the 3 dB optical bandwidth is 18 GHz. The modulator's RF efficiency and optical insertion loss still need to be improved. For modulators made on semi-insulating InP substrate, a capacitance in the range 0.1 to 0.2 pF is measured.
© (1992) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Paul K. L. Yu, Yet Zen Liu, Albert L. Kellner, Andrew R. Williams, Benson C. Lam, and X. S. Jiang "Design and fabrication of InGaAsP/InP waveguide modulators for microwave applications", Proc. SPIE 1703, Optical Technology for Microwave Applications VI and Optoelectronic Signal Processing for Phased-Array Antennas III, (2 December 1992); https://doi.org/10.1117/12.138398
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KEYWORDS
Modulators

Waveguides

Microwave radiation

Capacitance

Quantum wells

Absorption

Modulation

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