Obtaining process information from defect detection data to focus defect reduction programs in the fab environment

Patricia Gabella; Elizabeth A. Knowles

doi:10.1117/12.148986

4 August 1993 Obtaining process information from defect detection data to focus defect reduction programs in the fab environment

Patricia Gabella, Elizabeth A. Knowles

Author Affiliations +

Proceedings Volume 1926, Integrated Circuit Metrology, Inspection, and Process Control VII; (1993) https://doi.org/10.1117/12.148986
Event: SPIE'S 1993 Symposium on Microlithography, 1993, San Jose, CA, United States

Abstract

This paper presents an in-line monitoring scheme and zone partitioning experiment. An automated laser based wafer inspection system, linked with a defect data management station was integrated into the fab process flow as part of a defect reduction strategy. The results emphasize the feasibility of such a strategy as well as the ease of integration once such a strategy is established.

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Patricia Gabella and Elizabeth A. Knowles "Obtaining process information from defect detection data to focus defect reduction programs in the fab environment", Proc. SPIE 1926, Integrated Circuit Metrology, Inspection, and Process Control VII, (4 August 1993); https://doi.org/10.1117/12.148986

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