Structure study on electrochromic films of nickel oxide

Xingfang Hu; Xiaofeng Chen; Xiangyun Song

doi:10.1117/12.161957

22 October 1993 Structure study on electrochromic films of nickel oxide

Xingfang Hu, Xiaofeng Chen, Xiangyun Song

Proceedings Volume 2017, Optical Materials Technology for Energy Efficiency and Solar Energy Conversion XII; (1993) https://doi.org/10.1117/12.161957
Event: SPIE's 1993 International Symposium on Optics, Imaging, and Instrumentation, 1993, San Diego, CA, United States

Abstract

Using HREM, the relationship between structure and electrochromic properties of rf diode sputtered nickel oxide films with good and poor electrochromic performance has been investigated. The experimental results indicate that all two kinds of films consist of cubic nickel oxide with nano-crystal structure. For the films having good electrochromic properties, the grain size ranges about 5 - 10 nm. In the films exhibiting poor performance, an amorphous phase of nickel oxide as a continuous phase existing in the film has been observed and the cubic nickel oxide grains appear as isolate island existing in the amorphous phase. From the structural features of the films, it may be concluded that the grain boundary of nano- polycrystalline structure plays an important role in the electrochromic reaction and the grain boundary would act as channel for the injection and extraction of alkali metal ions and electrons during the coloring and bleaching process. So, it is important to control the structure of films in the deposition process to prepare the film with good electrochromic performance.

Citation Download Citation

Xingfang Hu, Xiaofeng Chen, and Xiangyun Song "Structure study on electrochromic films of nickel oxide", Proc. SPIE 2017, Optical Materials Technology for Energy Efficiency and Solar Energy Conversion XII, (22 October 1993); https://doi.org/10.1117/12.161957

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