Iron silicide formation by excimer laser pulses

Armando Luches; Emilia D'Anna; Gilberto Leggieri; Stefan Luby; Eva Majkova; Guiseppe Majni; Paolo Mengucci

doi:10.1117/12.167560

1 February 1994 Iron silicide formation by excimer laser pulses

Armando Luches, Emilia D'Anna, Gilberto Leggieri, Stefan Luby, Eva Majkova, Guiseppe Majni, Paolo Mengucci

Proceedings Volume 2045, Laser-Assisted Fabrication of Thin Films and Microstructures; (1994) https://doi.org/10.1117/12.167560
Event: Optics Quebec, 1993, Quebec City, Canada

Abstract

We report the synthesis of iron silicide layers by multipulse excimer (XeCl) laser irradiation of Si/Fe bilayers (50 and 90 nm thick, respectively) deposited on single crystal silicon wafers. A mixture of iron silicide phases is usually formed after a few hundreds of laser pulses at the fluence of 0.5 J/cm² with a repetition rate of 50 Hz. After thousand pulses the high- temperature stable (alpha) -FeSi₂ silicide forms.

Citation Download Citation

Armando Luches, Emilia D'Anna, Gilberto Leggieri, Stefan Luby, Eva Majkova, Guiseppe Majni, and Paolo Mengucci "Iron silicide formation by excimer laser pulses", Proc. SPIE 2045, Laser-Assisted Fabrication of Thin Films and Microstructures, (1 February 1994); https://doi.org/10.1117/12.167560

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