Manufacturing feasibility of OPC masks for 0.25-um rule devices

Hiroichi Kawahira; Mikio Katsumata; Keisuke Tsudaka; Akihiro Ogura; Manabu Tomita; Satoru Nozawa

doi:10.1117/12.245218

24 July 1996 Manufacturing feasibility of OPC masks for 0.25-μm rule devices

Hiroichi Kawahira, Mikio Katsumata, Keisuke Tsudaka, Akihiro Ogura, Manabu Tomita, Satoru Nozawa

Proceedings Volume 2793, Photomask and X-Ray Mask Technology III; (1996) https://doi.org/10.1117/12.245218
Event: Symposium on Photomask and X-Ray Mask Technology, 1996, Kawasaki City, Japan

Abstract

A feasibility of optical proximity effect correction (OPC) mask manufacturing with a state of the art mask fabrication processing and systems is demonstrated focusing on the 0.25 μm devices and 4X reticle generation. For realistic OPC mask fabrication, electron beam (EB) resist processing in terms of CD accuracy, mask defect inspection thoroughness and mask defect repair accuracy are studied in detail. For the positive resist process, EB proximity effect correction is applied in order to improve the linearity to meet required CD specifications. Based on such evaluation, practical criteria for OPC pattern generation are applied into an automatic OPC software. It is verified that by using the software with the criteria given, 0.25 μm memory device patterns can be corrected with a sufficient optical lithography imaging performance and a reasonable data volume. It is concluded that manufacturing feasibility of sufficiently effective OPC masks is verified as a result of concurrent development on the mask fabrication and automatic OPC software. Engineering tasks in the future are also proposed.

Citation Download Citation

Hiroichi Kawahira, Mikio Katsumata, Keisuke Tsudaka, Akihiro Ogura, Manabu Tomita, and Satoru Nozawa "Manufacturing feasibility of OPC masks for 0.25-μm rule devices", Proc. SPIE 2793, Photomask and X-Ray Mask Technology III, (24 July 1996); https://doi.org/10.1117/12.245218

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available