Dielectric nonlinearity and loss in ferroelectric thin films

Xiaoxing Xi

doi:10.1117/12.273734

9 May 1997 Dielectric nonlinearity and loss in ferroelectric thin films

Xiaoxing Xi

Proceedings Volume 2991, Laser Applications in Microelectronic and Optoelectronic Manufacturing II; (1997) https://doi.org/10.1117/12.273734
Event: Photonics West '97, 1997, San Jose, CA, United States

Abstract

Pulsed laser deposition has been used to deposit multilayer heterostructures consisting of high temperature superconductor (HTS) and ferroelectric layers for tunable microwave device applications. The dielectric nonlinearity and loss of the ferroelectric thin films are the key material parameters determining the performance of the tunable devices and hence the feasibility of this technology. In this paper, I summarize the current understanding of these issues and outline the strategies to study these problems.

Citation Download Citation

Xiaoxing Xi "Dielectric nonlinearity and loss in ferroelectric thin films", Proc. SPIE 2991, Laser Applications in Microelectronic and Optoelectronic Manufacturing II, (9 May 1997); https://doi.org/10.1117/12.273734

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