New electron microscope system for pattern placement metrology

Harald Bosse; Wolfgang Haessler-Grohne

doi:10.1117/12.301186

12 February 1997 New electron microscope system for pattern placement metrology

Harald Bosse, Wolfgang Haessler-Grohne

Proceedings Volume 3236, 17th Annual BACUS Symposium on Photomask Technology and Management; (1997) https://doi.org/10.1117/12.301186
Event: 17th Annual BACUS Photomask Technology and Management, 1997, Redwood City, CA, United States

Abstract

Details of a new comparator for pattern placement measurement on masks and wafers are described. The electron-optical metrology system (EOMS) consists of a low energy scanning electron microscope (SEM) with a large specimen chamber and an x-y-stage with 300 mm travel range controlled by laser vacuum interferometry. The design of the instrument is discussed with special emphasis on its metrology components, the laser interferometer and the electron beam probe. The secondary electron image formation of mask and wafer structures and the extraction of the edge position information are described. Recent comparison measurements between the EOMS and a LMS 2020 metrology system are reported. A discussion of the results includes the deviations between both coordinate measurements and the problem of traceability of the length measurement on both comparators. Applications of further measurements on different mask types are presented.

Citation Download Citation

Harald Bosse and Wolfgang Haessler-Grohne "New electron microscope system for pattern placement metrology", Proc. SPIE 3236, 17th Annual BACUS Symposium on Photomask Technology and Management, (12 February 1997); https://doi.org/10.1117/12.301186

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