Properties of liquid crystal thin films grown by pulsed-laser deposition

Jose A. Gonzalo de los Reyes; Dan A. Allwood; Peter E. Dyer; Michael Hird

doi:10.1117/12.309521

3 June 1998 Properties of liquid crystal thin films grown by pulsed-laser deposition

Jose A. Gonzalo de los Reyes, Dan A. Allwood, Peter E. Dyer, Michael Hird

Proceedings Volume 3274, Laser Applications in Microelectronic and Optoelectronic Manufacturing III; (1998) https://doi.org/10.1117/12.309521
Event: Optoelectronics and High-Power Lasers and Applications, 1998, San Jose, CA, United States

Abstract

Thin films of 4-cyano-4'-pentylbiphenyl (5CB) and E7 liquid crystals have been fabricated by pulsed laser deposition. The suitability of different lasers (ArF, KrF, XeCl and CO₂) has been investigated over a range of fluence using visible-UV and infrared absorption and optical polarizing microscopy to characterize the films. High performance liquid chromatography and matrix assisted laser desorption ionization mass spectroscopy were used to assess the extent of decomposition of the films. The high photon energy of ArF and KrF excimer lasers produce severe and partial decomposition of the deposited films respectively, whilst films deposited using the CO₂ laser also present partial degradation, most likely related to thermal processes during the laser-target interaction. Films with near identical structure to that of the starting LC target and good textures were obtained by XeCl laser deposition up to fluences of 130 mJ/cm².

Citation Download Citation

Jose A. Gonzalo de los Reyes, Dan A. Allwood, Peter E. Dyer, and Michael Hird "Properties of liquid crystal thin films grown by pulsed-laser deposition", Proc. SPIE 3274, Laser Applications in Microelectronic and Optoelectronic Manufacturing III, (3 June 1998); https://doi.org/10.1117/12.309521

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