Holographic antireflection coatings

Jacques E. Ludman; Timothy D. Upton; David W. Watt; T. Yurovchak

doi:10.1117/12.304512

26 March 1998 Holographic antireflection coatings

Jacques E. Ludman, Timothy D. Upton, David W. Watt, T. Yurovchak

Author Affiliations +

Proceedings Volume 3294, Holographic Materials IV; (1998) https://doi.org/10.1117/12.304512
Event: Photonics West '98 Electronic Imaging, 1998, San Jose, CA, United States

Abstract

Using holographic methods to fabricate antireflection coatings is attractive because arbitrarily small reflectivities may be achieved at a single wavelength with a simple photographic process. In this paper, we discuss the theoretical aspects of these holograms and the technical aspects of fabricating them. We present numerical simulations that predict the spectral response of the coating as a function of the bandwidth of the recording source and the thickness and modulation of the emulsion. These results are confirmed with spectrophotometer measurements of actual coatings. Recording holographic antireflection coatings requires a single collimated light source. The hologram-air interface is sued to create the second wave; this allows the coating to automatically correct for variation in the surface of the hologram. However, this method requires a post recording coating procedure to produce a diffracted wave with the correct phase shift. After the hologram is recorded and processed, a thin layer of SiO₂ or MgF₂ is applied to the hologram to adjust the phase shift between the diffracted wave and the surface reflection. Additionally this coating procedure enhances the durability of the coating and, if MgF₂ is used, lowers the refractive index modulation required for complete cancellation of the surface reflection.

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Jacques E. Ludman, Timothy D. Upton, David W. Watt, and T. Yurovchak "Holographic antireflection coatings", Proc. SPIE 3294, Holographic Materials IV, (26 March 1998); https://doi.org/10.1117/12.304512

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