Equivalent modeling of SCALPEL mask membrane distortions

Gerald A. Dicks; Roxann L. Engelstad; Edward G. Lovell; James Alexander Liddle

doi:10.1117/12.309623

5 June 1998 Equivalent modeling of SCALPEL mask membrane distortions

Gerald A. Dicks, Roxann L. Engelstad, Edward G. Lovell, James Alexander Liddle

Proceedings Volume 3331, Emerging Lithographic Technologies II; (1998) https://doi.org/10.1117/12.309623
Event: 23rd Annual International Symposium on Microlithography, 1998, Santa Clara, CA, United States

Abstract

Considering semiconductor industry projections, sub-0.10 micrometers technology will most likely require a new advanced lithography. Scattering with Angular Limitation Projection Electron-beam Lithography (SCALPEL) is one such lithography being developed to meet this need. As with all lithographies, successful implementation of the SCALPEL technique is dependent upon the development of a low- distortion mask; distortions lead to pattern placement errors on the integrated circuit. Therefore, finite element (FE) models have been developed in order to quantify and minimize mask membrane distortions. The support grillage, i.e., the struts, in the pattern area on a SCALPEL mask require a large number of elements to determine mechanical displacements of the mask membrane. The element density becomes computationally expensive and may exceed the computer hardware limitations. Therefore, an equivalent modeling technique has been developed to reduce the number of elements required to simulate the behavior of the mask, thereby reducing computation time and remaining within the computer hardware limitations.

Citation Download Citation

Gerald A. Dicks, Roxann L. Engelstad, Edward G. Lovell, and James Alexander Liddle "Equivalent modeling of SCALPEL mask membrane distortions", Proc. SPIE 3331, Emerging Lithographic Technologies II, (5 June 1998); https://doi.org/10.1117/12.309623

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available

Members: $17.00

Non-members: $21.00 ADD TO CART

PROCEEDINGS
9 PAGES

DOWNLOAD PAPER SAVE TO MY LIBRARY

GET CITATION

RIGHTS & PERMISSIONS

Get copyright permission Get copyright permission on Copyright Marketplace

KEYWORDS

Photomasks

Charged-particle lithography

Semiconducting wafers

Lithography

Silicon

Computer hardware

Solids

Show All Keywords

Keywords/Phrases

Search In:

Publication Years