Modeling study of image formation with point sources

Srinivas B. Bollepalli; Mumit Khan; Franco Cerrina

doi:10.1117/12.309569

5 June 1998 Modeling study of image formation with point sources

Srinivas B. Bollepalli, Mumit Khan, Franco Cerrina

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Proceedings Volume 3331, Emerging Lithographic Technologies II; (1998) https://doi.org/10.1117/12.309569
Event: 23rd Annual International Symposium on Microlithography, 1998, Santa Clara, CA, United States

Abstract

It is well known that a point source produces a small magnification of the mask pattern on the wafer due to divergence; the effect becomes especially noticeable at the corners and edges of the field. In this article we model the image formation due to a point source and compare the deviations of the aerial images and developed patterns, from those at the center of the field. We illustrate the behavior with several computational results.

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Srinivas B. Bollepalli, Mumit Khan, and Franco Cerrina "Modeling study of image formation with point sources", Proc. SPIE 3331, Emerging Lithographic Technologies II, (5 June 1998); https://doi.org/10.1117/12.309569

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