High-aspect-ratio depth determination using nondestructive AFM

V.C. Jai Prakash; Mark E. Lagus; A. Meyyappan; Sylvain Muckenhirn

doi:10.1117/12.350814

14 June 1999 High-aspect-ratio depth determination using nondestructive AFM

V.C. Jai Prakash, Mark E. Lagus, A. Meyyappan, Sylvain Muckenhirn

Proceedings Volume 3677, Metrology, Inspection, and Process Control for Microlithography XIII; (1999) https://doi.org/10.1117/12.350814
Event: Microlithography '99, 1999, Santa Clara, CA, United States

Abstract

ULSI processing for the manufacture of devices such as DRAMs involves fabrication of several high aspect ratio structures. The determination and control of depth of these structures is crucial for device performance. We report the utilization of Atomic Force Microscopy to characterize 0.2 micrometers ground rule products. Features with 2.1 micrometers depth and 0.2 micrometers top nominal top width dimensions can be consistently measured. TO accomplish this a recently developed Deep Trench scan mode is employed and used in conjunction with new Super Angle Tapered CD and Super Angle COne tips. New analysis algorithms are developed to extract eh data in a repeatable from width decreased sensitivity to changes in tip size, top shape, and sample.

Citation Download Citation

V.C. Jai Prakash, Mark E. Lagus, A. Meyyappan, and Sylvain Muckenhirn "High-aspect-ratio depth determination using nondestructive AFM", Proc. SPIE 3677, Metrology, Inspection, and Process Control for Microlithography XIII, (14 June 1999); https://doi.org/10.1117/12.350814

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