Embedded optical sensors and data processing for thin film deposition

David J. Robbins; Alan Marrs; Christopher Pickering; Allister W. Dann; John L. Glasper; John Russell

doi:10.1117/12.346246

23 April 1999 Embedded optical sensors and data processing for thin film deposition

David J. Robbins, Alan Marrs, Christopher Pickering, Allister W. Dann, John L. Glasper, John Russell

Proceedings Volume 3742, Process and Equipment Control in Microelectronic Manufacturing; (1999) https://doi.org/10.1117/12.346246
Event: Microelectronic Manufacturing Technologies, 1999, Edinburgh, United Kingdom

Abstract

Two sensor techniques and a data analysis algorithm have been investigated, to assess their suitability for in-situ process monitoring and integrated metrology in semiconductor manufacture. The first sensor is a prototype system which uses two laser beams of different wavelength to module the surface temperature of a wafer. The ratio of detected thermal radiances at the two wavelengths is ideally independent of wafer emissivity. Initial measurements on differently-processed silicon wafers in the temperature range 620 - 1000 degree(s)C show systematic errors of the order 10 degree(s)C. The second sensor is a spectroscopic ellipsometry system fully integrated onto a low pressure chemical vapor deposition reactor for monitoring and controlling growth of silicon-germanium (SiGe) alloys. Algorithms for determining alloy composition and film thicknesses during growth are discussed. The use of a sample-based particle filter based on Bayesian statistics for tracking a semiconductor process is described for the first time.

Citation Download Citation

David J. Robbins, Alan Marrs, Christopher Pickering, Allister W. Dann, John L. Glasper, and John Russell "Embedded optical sensors and data processing for thin film deposition", Proc. SPIE 3742, Process and Equipment Control in Microelectronic Manufacturing, (23 April 1999); https://doi.org/10.1117/12.346246

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