New data processing of dummy pattern generation adaptive for CMP process

Shinichi Ueki; Isao Ashida; Hiroichi Kawahira

doi:10.1117/12.360198

25 August 1999 New data processing of dummy pattern generation adaptive for CMP process

Shinichi Ueki, Isao Ashida, Hiroichi Kawahira

Proceedings Volume 3748, Photomask and X-Ray Mask Technology VI; (1999) https://doi.org/10.1117/12.360198
Event: Photomask and X-Ray Mask Technology VI, 1999, Yokohama, Japan

Abstract

For planarization of interlevel dielectric between two wiring layers, chemical mechanical polishing (CMP) is used from 0.25 micrometer devices. Here, in order to improve global planarity, dummy patterns area added to the original wiring patterns. In the conventional dummy generation system, because the all wiring patterns are oversized geometrically to obtain CMP area, the geometrical oversizing consumes a long time. In order to reduce the time of geometrical oversizing, minimum CMP area and maximum CMP area, which is calculated faster than geometrical oversizing, are introduced in the new data processing. At first, instead of the geometrical oversizing, the total area of patterns (minimum CMP area) and the total area of individually oversized patterns (maximum CMP area) are calculated at each small region in wiring layer. Then dummy generation regions are selected by using these two total area. When all of surroundings of a small region are decided to be dummy generation region or not, the geometrical oversizing can be omitted at the small region. As the number of regions at which the geometrical oversizing is omitted increases, the data processing time of dummy pattern generation improves significantly. As the result, using a sample data: 0.25 micrometer ASIC device wiring data with about 50 million figures, the processing time of as fast as about 1 hour 30 minutes has been achieved by the new system compared to about 2 hours and 10 minutes with the conventional system. This improvement of the processing time contributes to shorten TAT of mask data processing for ULSI.

Citation Download Citation

Shinichi Ueki, Isao Ashida, and Hiroichi Kawahira "New data processing of dummy pattern generation adaptive for CMP process", Proc. SPIE 3748, Photomask and X-Ray Mask Technology VI, (25 August 1999); https://doi.org/10.1117/12.360198

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available