Stereolithography with XeCl excimer laser/lamp

Saburoh Satoh; Takao Tanaka; Satoshi Ihara; Chobei Yamabe

doi:10.1117/12.377028

7 February 2000 Stereolithography with XeCl excimer laser/lamp

Saburoh Satoh, Takao Tanaka, Satoshi Ihara, Chobei Yamabe

Proceedings Volume 3888, High-Power Lasers in Manufacturing; (2000) https://doi.org/10.1117/12.377028
Event: Advanced High-Power Lasers and Applications, 1999, Osaka, Japan

Abstract

For the stereo-lithography, XeCl excimer laser has been adapted to improve the utilization efficiency of laser energy. Because of the beam uniformity was made better by a homogenizer, the quantity of cured resin per laser energy was increased compare than that without the homogenizer. With this method a simple 3D object was created, and its was proved that XeCl excimer laser was possible to apply for the stereo- lithography.

Citation Download Citation

Saburoh Satoh, Takao Tanaka, Satoshi Ihara, and Chobei Yamabe "Stereolithography with XeCl excimer laser/lamp", Proc. SPIE 3888, High-Power Lasers in Manufacturing, (7 February 2000); https://doi.org/10.1117/12.377028

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