Comparison of ArF and KrF laser performance at 2 kHz for microlithography

Herve Besaucele; Palash P. Das; Thomas P. Duffey; Todd J. Embree; Alexander I. Ershov; Vladimir B. Fleurov; Steven L. Grove; Paul C. Melcher; Richard M. Ness; Gunasiri G. Padmabandu

doi:10.1117/12.388986

5 July 2000 Comparison of ArF and KrF laser performance at 2 kHz for microlithography

Herve Besaucele, Palash P. Das, Thomas P. Duffey, Todd J. Embree, Alexander I. Ershov, Vladimir B. Fleurov, Steven L. Grove, Paul C. Melcher, Richard M. Ness, Gunasiri G. Padmabandu

Author Affiliations +

Proceedings Volume 4000, Optical Microlithography XIII; (2000) https://doi.org/10.1117/12.388986
Event: Microlithography 2000, 2000, Santa Clara, CA, United States

Abstract

Exposure tools for 193nm lithography are expected to use Argon-Fluoride lasers at repetition rates of at least 2kHz. We are showing that, by revisiting several key technologies, the performance and reliability of ArF lasers at 2 kHz are trending towards a level comparable to KrF lasers.

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Herve Besaucele, Palash P. Das, Thomas P. Duffey, Todd J. Embree, Alexander I. Ershov, Vladimir B. Fleurov, Steven L. Grove, Paul C. Melcher, Richard M. Ness, and Gunasiri G. Padmabandu "Comparison of ArF and KrF laser performance at 2 kHz for microlithography", Proc. SPIE 4000, Optical Microlithography XIII, (5 July 2000); https://doi.org/10.1117/12.388986

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