Fabrication of TiNi thin films by pulsed-laser deposition

Xiaoyu Chen; Yongfeng Lu; ZhongMin Ren; Sha Zhu

doi:10.1117/12.456841

25 February 2002 Fabrication of TiNi thin films by pulsed laser deposition

Xiaoyu Chen, Yongfeng Lu, ZhongMin Ren, Sha Zhu

Proceedings Volume 4426, Second International Symposium on Laser Precision Microfabrication; (2002) https://doi.org/10.1117/12.456841
Event: Second International Symposium on Laser Precision Micromachining, 2001, Singapore, Singapore

Abstract

TiNi shape memory alloy (SMA) thin films have been fabricated by pulsed-laser deposition (PLD) at different substrate temperatures. The stoichiometry, surface morphology and crystallinity of the films were characterized by X-ray photoelectron spectroscopy (XPS), atomic force microscope (AFM) and X-ray diffraction (XRD). The transformation behavior and crystallization temperatures were investigated by differential scanning calorimetry (DSC). It is found that the Ni content of the deposited films ranges from 46.7 to 52.09 at.%. The films deposited at low temperature are amorphous. The crystallization temperature of the Ti-51.5 at.% Ni thin film is 449 degree(s)C. The martensitic transformation temperature of the film is -20.8 degree(s)C.

Citation Download Citation

Xiaoyu Chen, Yongfeng Lu, ZhongMin Ren, and Sha Zhu "Fabrication of TiNi thin films by pulsed laser deposition", Proc. SPIE 4426, Second International Symposium on Laser Precision Microfabrication, (25 February 2002); https://doi.org/10.1117/12.456841

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