Measurement of total integrated scatter of optical coatings for 157-nm lithography

Tadahiko Saito; Jun Saito; Etsuro Nakamura; Tatsunobu Kudo; Masanao Kagaya; Tetsuo Takahashi

doi:10.1117/12.450106

10 December 2001 Measurement of total integrated scatter of optical coatings for 157-nm lithography

Tadahiko Saito, Jun Saito, Etsuro Nakamura, Tatsunobu Kudo, Masanao Kagaya, Tetsuo Takahashi

Proceedings Volume 4449, Optical Metrology Roadmap for the Semiconductor, Optical, and Data Storage Industries II; (2001) https://doi.org/10.1117/12.450106
Event: International Symposium on Optical Science and Technology, 2001, San Diego, CA, United States

Abstract

A new Coblentz type scatterometer is developed for evaluation of 157-nm optical coatings. The Coblentz hemisphere has ellipsoidal design for higher sensitivity and stability. The scatterometer works under nitrogen atmosphere keeping away from the organic contamination. Some kind of antireflective coatings are obtained from several Japanese suppliers and evaluated by the scatterometer. Results of the scatter measurement are almost equal except one sample that includes Na₃AlF₆ layer as low refractive index material. Its extremely high scatter loss could be ascribed degradation by reaction to the water in the air.

Citation Download Citation

Tadahiko Saito, Jun Saito, Etsuro Nakamura, Tatsunobu Kudo, Masanao Kagaya, and Tetsuo Takahashi "Measurement of total integrated scatter of optical coatings for 157-nm lithography", Proc. SPIE 4449, Optical Metrology Roadmap for the Semiconductor, Optical, and Data Storage Industries II, (10 December 2001); https://doi.org/10.1117/12.450106

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