Newly developed acrylic copolymers for ArF photoresist

Yoshihiro Kamon; Hikaru Momose; Hideaki Kuwano; Tadayuki Fujiwara; Masaharu Fujimoto

doi:10.1117/12.474263

24 July 2002 Newly developed acrylic copolymers for ArF photoresist

Yoshihiro Kamon, Hikaru Momose, Hideaki Kuwano, Tadayuki Fujiwara, Masaharu Fujimoto

Proceedings Volume 4690, Advances in Resist Technology and Processing XIX; (2002) https://doi.org/10.1117/12.474263
Event: SPIE's 27th Annual International Symposium on Microlithography, 2002, Santa Clara, California, United States

Abstract

We have developed novel acrylic copolymers for ArF photoresist which have more etching durability than usual. The excellent one of those copolymers in handling contains 8- or 9- methacryloyloxy-4-oxatricyclo[5.2.1.0^2,6]decan-3-one (OTDMA) and (gamma) ,(gamma) -dimethyl-(alpha) -methylene-(gamma) -butyrolac tone (DMMB). OTDMA is a new methacrylic ester monomer having a lactone unit with bridged structure. DMMB introduces a lactone structure to the main chain of acrylic copolymers. It was suggested that the solubility of monomers depends on the hindrance of their polar group, and the role of the hydrophilic monomers has been discussed from the standpoint of the position of their hydrophilic parts.

Citation Download Citation

Yoshihiro Kamon, Hikaru Momose, Hideaki Kuwano, Tadayuki Fujiwara, and Masaharu Fujimoto "Newly developed acrylic copolymers for ArF photoresist", Proc. SPIE 4690, Advances in Resist Technology and Processing XIX, (24 July 2002); https://doi.org/10.1117/12.474263

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