Paper
9 August 2002 Plume reflection in pulsed laser deposition
Aurelian Marcu, Constantin Grigoriu, Weihua Jiang, Kiyoshi Yatsui
Author Affiliations +
Proceedings Volume 4762, ALT'01 International Conference on Advanced Laser Technologies; (2002) https://doi.org/10.1117/12.478638
Event: International Conference on: Advanced Laser Technologies (ALT'01), 2001, Constanta, Romania
Abstract
Plume reflection has been studied as a possibility for depositing on a direction perpendicular to target, convenient for manipulation of big size substrates and for avoiding the presence of droplets on film surface. Plume behaviour during reflection on a 45 degree(s) oriented plane surface has been monitored by a high- speed camera. Thin film, deposited by reflected plume, has been analysed by scanning electron microscopy (SEM) and atomic forces microscopy (AFM). Comparing with a standard deposition a 1-2 order of magnitude improvement for film roughness (RMS) has been noticed at the expense of one order of magnitude diminuation of deposition rate. The results have shown significant dependencies of film thickness and surface quality on plume reflection angle. Some aspects of big particles movement in deposition process are also presented.
© (2002) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Aurelian Marcu, Constantin Grigoriu, Weihua Jiang, and Kiyoshi Yatsui "Plume reflection in pulsed laser deposition", Proc. SPIE 4762, ALT'01 International Conference on Advanced Laser Technologies, (9 August 2002); https://doi.org/10.1117/12.478638
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Cited by 4 scholarly publications.
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KEYWORDS
Reflection

Reflectors

Thin films

Scanning electron microscopy

Pulsed laser deposition

Particles

Atomic force microscopy

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