Advanced industrial metrology used for qualification of high-quality optical materials

Axel Engel; Gerhard Westenberger; L. Bartelmess; Oliver Sohr; Rainer Haspel; Ewald Morsen

doi:10.1117/12.451741

11 November 2002 Advanced industrial metrology used for qualification of high-quality optical materials

Axel Engel, Gerhard Westenberger, L. Bartelmess, Oliver Sohr, Rainer Haspel, Ewald Morsen

Author Affiliations +

Proceedings Volume 4779, Advanced Characterization Techniques for Optical, Semiconductor, and Data Storage Components; (2002) https://doi.org/10.1117/12.451741
Event: International Symposium on Optical Science and Technology, 2002, Seattle, WA, United States

Abstract

Schott Glass is producing and developing the optical material for various specialized applications in photonics, optical and microlithography technology. In order to achieve the specifications several of metrology R&D activities have been done and hardware has been installed in the metrology labs. Today special diagnostics are available to qualify materials for the absolute refractive index, the transmissin, radiation durability and inner quality to ensure the quality of the produced materials. Methods used for this qualifications are minimum deviation, precision spectral photometer, in-situ transmission measurements using UV lasers and Rayleigh Scattering. The optical material quality requirements of such materials are extremely high and still increasing. Therefore further development and implementation of diagnostics have been iniatiated, e.g. Raman Scattering, fluorescence and refractive index measurements. We present the status of R&D activities for metrology, which is necessary to visualize the status and the improvement of the optical quality with the help of new and improved metrology.

Citation Download Citation

Axel Engel, Gerhard Westenberger, L. Bartelmess, Oliver Sohr, Rainer Haspel, and Ewald Morsen "Advanced industrial metrology used for qualification of high-quality optical materials", Proc. SPIE 4779, Advanced Characterization Techniques for Optical, Semiconductor, and Data Storage Components, (11 November 2002); https://doi.org/10.1117/12.451741

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

;

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE