System for angle-resolved and total light scattering, transmittance, and reflectance measurements of optical components at 157 nm and 193 nm

Stefan Gliech; Henning Gessner; Angela Duparre

doi:10.1117/12.472395

30 May 2003 System for angle-resolved and total light scattering, transmittance, and reflectance measurements of optical components at 157 nm and 193 nm

Stefan Gliech, Henning Gessner, Angela Duparre

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Proceedings Volume 4932, Laser-Induced Damage in Optical Materials: 2002 and 7th International Workshop on Laser Beam and Optics Characterization; (2003) https://doi.org/10.1117/12.472395
Event: XXXIV Annual Symposium on Optical Materials for High Power Lasers: Boulder Damage Symposium, 2002, Boulder, CO, United States

Abstract

A system is presented that measures total and angle resolved light scattering, reflectance and transmittance at 193 nm and 157 nm. Substrates and coatings for VUV lithography components can be investigated with high sensitivity, down to scattering levels of 1 ppm.

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Stefan Gliech, Henning Gessner, and Angela Duparre "System for angle-resolved and total light scattering, transmittance, and reflectance measurements of optical components at 157 nm and 193 nm", Proc. SPIE 4932, Laser-Induced Damage in Optical Materials: 2002 and 7th International Workshop on Laser Beam and Optics Characterization, (30 May 2003); https://doi.org/10.1117/12.472395

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