Paper
26 June 2003 Catadioptric lens development for DUV and VUV projection optics
Author Affiliations +
Abstract
According to the International Technology Roadmap for Semiconductors (ITRS), the 65nm technology node is forecast to appear in 2007. In this paper, we propose two specifications for the projection optics at 65nm nodes. The one is over 1.0 numerical aperture (NA) at 193nm lithography by liquid immersion. The other is 0.85 NA at 157nm lithography. Since it almost impossible for traditional dioptric optics to realize these specifications, catadioptric is supposedly the leading optics for an extreme optical lithography, like 65nm node. Described in the paper are feasibility study for catadioptric optics, and our assembly strategy. Emphasis is placed on our selection methodology among a variety of catadioptric configurations.
© (2003) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Yasuhiro Ohmura, Masahiro Nakagawa, Tomoyuki Matsuyama, and Yuichi Shibazaki "Catadioptric lens development for DUV and VUV projection optics", Proc. SPIE 5040, Optical Microlithography XVI, (26 June 2003); https://doi.org/10.1117/12.485462
Lens.org Logo
CITATIONS
Cited by 4 scholarly publications and 26 patents.
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
KEYWORDS
Combined lens-mirror systems

Refractor telescopes

Projection systems

Mirrors

Chromatic aberrations

Optical components

Calcium

RELATED CONTENT


Back to Top