Paper
3 November 2003 Grating fabrication through x-ray lithography
Pantazis Z. Mouroulis, Frank T. Hartley, Richard E. Muller, Daniel W. Wilson, Aidan Shori, Martin Feldman, Li Jiang, Todd R. Christenson
Author Affiliations +
Abstract
Blazed gratings have been fabricated using gray-scale X-ray lithography. The gratings have high efficiency, low parasitic light, and high groove quality. They can be generated over a considerable depth for use anywhere in the ultraviolet to middle infrared range. They can also be recorded on substrates of considerable curvature.
© (2003) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Pantazis Z. Mouroulis, Frank T. Hartley, Richard E. Muller, Daniel W. Wilson, Aidan Shori, Martin Feldman, Li Jiang, and Todd R. Christenson "Grating fabrication through x-ray lithography", Proc. SPIE 5173, Current Developments in Lens Design and Optical Engineering IV, 51730D (3 November 2003); https://doi.org/10.1117/12.503200
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CITATIONS
Cited by 4 scholarly publications.
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KEYWORDS
Photomasks

Wavefronts

X-ray lithography

Coating

Fabrication

X-rays

Diffraction gratings

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