Theoretical simulation of extreme UV radiation source for lithography

Kazumi Fujima; Katsunobu Nishihara; Toru Kawamura; Hiroyuki Furukawa; Takashi Kagawa; Fumihiro Koike; Richard More; Masakatsu Murakami; Takeshi Nishikawa; Akira Sasaki; Atsushi Sunahara; Vasillii Zhakhovskii; Takashi Fujimoto; Hajime Tanuma

doi:10.1117/12.534989

20 May 2004 Theoretical simulation of extreme UV radiation source for lithography

Kazumi Fujima, Katsunobu Nishihara, Toru Kawamura, Hiroyuki Furukawa, Takashi Kagawa, Fumihiro Koike, Richard More, Masakatsu Murakami, Takeshi Nishikawa, Akira Sasaki, Atsushi Sunahara, Vasillii Zhakhovskii, Takashi Fujimoto, Hajime Tanuma

Author Affiliations +

Proceedings Volume 5374, Emerging Lithographic Technologies VIII; (2004) https://doi.org/10.1117/12.534989
Event: Microlithography 2004, 2004, Santa Clara, California, United States

Abstract

A possible design window for extreme ultraviolet (EUV) radiation source has been introduced, which is needed for its realistic use for next generation lithography. For this goal, we have prepared a set of numerical simulation codes to estimate the conversion efficiency from laser energy to radiation energy with a wavelength of 13.5 nm with 2 % bandwidth, which includes atomic structure, opacity and emissibity and hydro dynamics codes. The simulation explains well the observed conversion efficiency dependence of incident power using GEKKO XII laser system as well as spectral shapes. It is found that the conversion efficiency into 13.5 nm at 2% bandwidth has its maximum of a few percent at the laser intensity 1-2 x 10¹¹ W/cm².

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Kazumi Fujima, Katsunobu Nishihara, Toru Kawamura, Hiroyuki Furukawa, Takashi Kagawa, Fumihiro Koike, Richard More, Masakatsu Murakami, Takeshi Nishikawa, Akira Sasaki, Atsushi Sunahara, Vasillii Zhakhovskii, Takashi Fujimoto, and Hajime Tanuma "Theoretical simulation of extreme UV radiation source for lithography", Proc. SPIE 5374, Emerging Lithographic Technologies VIII, (20 May 2004); https://doi.org/10.1117/12.534989

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